Accession Number:

AD0601861

Title:

VAPOR DEPOSITED BORIDES OF GROUP IVA METALS.

Descriptive Note:

Technical Information series,

Corporate Author:

GENERAL ELECTRIC CO PHILADELPHIA PA MISSILE AND SPACE DIV

Personal Author(s):

Report Date:

1964-06-01

Pagination or Media Count:

31.0

Abstract:

The formation of vapor deposited TiB2, ZrB2 and HfB2 at 1400C was studied with respect to the influence of process variables on structure and stoichiometry. Stoichiometric, non-porous deposits of TiB2 were obtained ZrB2 and HfB2 deposits contained beta rhombohedral boron. Precision lattice parameters were determined for all three diborides. The effect of co-deposited boron on these parameters appears to be slight. A small degree of preferred orientation existed in materials made under these conditions which indicates that crystallites tend to be deposited with c axes parallel to the substrate. Grain size, orientation, porosity and stoichiometry are all influenced and therefore should be controllable by process variation. Author

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE