PROPERTIES OF TITANIUM AND RUTILE (TIO2) THIN FILMS.
Technical rept. Oct 64-Feb 66,
MASSACHUSETTS INST OF TECH CAMBRIDGE PHOTOCONDUCTIVE SEMICONDUCTORS AND DEVIC ES LAB
Pagination or Media Count:
The structure of titanium films deposited in ultrahigh vacuum upon various substrates has been studied as a function of deposition conditions and substrate preparation. Films exhibiting structures ranging in refinement from random polycrystalline to single crystal alpha-titanium have been obtained. Rutile TiO2 films generated by thermal oxidation of the above exhibited various orientational developments, depending primarily upon the structure of the originals. These relationships and the various techniques employed are described herein. In addition, ultraviolet absorption spectra of the rutile films were obtained. Correlation between the structures of the oxide and the ultraviolet absorption spectra permitted the assignment of major features of the latter to the absorption of particular polarizations of light determined with respect to the axes of rutile. Author
- Metallurgy and Metallography
- Solid State Physics