TRANSMISSION SPUTTERING RATIO IN MONOCRYSTALLINE SILVER FOILS AND ASSOCIATED REACTOR ANALYSIS OF SPUTTERED SILVER.
NAVAL POSTGRADUATE SCHOOL MONTEREY CA
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Thin monocrystalline films of 100 and 111 orientation were grown by epitaxy condensation on LiF substrates. Film thickness varied from 13,150 A to 17,520 A. Laue X-ray transmission patterns revealed the films to be 75 to 90 monocrystalline in nature. Sputtering ratios in the thin films were obtained for a 50 transmission point. Sputtering ratios for 100 and 111 orientations varied from 0.01 to 0.06. The sputtered silver was collected on carbon backings and irradiated in the AGN-201 reactor at 200 watts for four minutes. A computer analysis of the resulting decay curves yielded amounts of silver sputtered. The minimum acceptable reactor detection limit for silver was found to be 1 x 10 to the minus 7th power. Author