Accession Number:

AD0488346

Title:

TRANSMISSION SPUTTERING RATIO IN MONOCRYSTALLINE SILVER FOILS AND ASSOCIATED REACTOR ANALYSIS OF SPUTTERED SILVER.

Descriptive Note:

Master's thesis,

Corporate Author:

NAVAL POSTGRADUATE SCHOOL MONTEREY CA

Personal Author(s):

Report Date:

1966-05-01

Pagination or Media Count:

76.0

Abstract:

Thin monocrystalline films of 100 and 111 orientation were grown by epitaxy condensation on LiF substrates. Film thickness varied from 13,150 A to 17,520 A. Laue X-ray transmission patterns revealed the films to be 75 to 90 monocrystalline in nature. Sputtering ratios in the thin films were obtained for a 50 transmission point. Sputtering ratios for 100 and 111 orientations varied from 0.01 to 0.06. The sputtered silver was collected on carbon backings and irradiated in the AGN-201 reactor at 200 watts for four minutes. A computer analysis of the resulting decay curves yielded amounts of silver sputtered. The minimum acceptable reactor detection limit for silver was found to be 1 x 10 to the minus 7th power. Author

Subject Categories:

  • Crystallography

Distribution Statement:

APPROVED FOR PUBLIC RELEASE