CALCULATION OF SURFACE BINDING ENERGIES BY COMPUTER SIMULATION OF THE SPUTTERING PROCESS.
NAVAL POSTGRADUATE SCHOOL MONTEREY CALIF
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Sputtering of monocrystalline copper, a face-centered cubic, was investigated by computer simulation techniques using the Born-Mayer potential. Normally incident argon ions were shot into the 111, 110, and 100 orientation at various energies. Qualitatively correct deposit patterns were obtained for all orientations. Surface irregularities were found to play a significant role in the sputtering mechanism. Approximate values for the surface binding energy on the 111 and 110 orientations were 2.25 eV and 3.0 eV, respectively. Author
- Nuclear Physics and Elementary Particle Physics