Accession Number:

AD0453220

Title:

RELIABLE DIELECTRIC FILMS FOR MICROCIRCUITS

Descriptive Note:

Semi-annual technical rept. no. 1, 1 Apr-31 Aug 1964

Corporate Author:

STANFORD RESEARCH INST MENLO PARK CA

Report Date:

1964-10-26

Pagination or Media Count:

54.0

Abstract:

Contents Dielectric Breakdown at Conductor Edges--The Edge Effect Properties and Performance of SiO Capacitors Interrelation of Deposition Parameters Rate and Dielectric Thickness with Dielectric Properties Leakage Resistance, Dissipation Factor, Temperature Coefficient of Capacitance TCC progress of Life Tests at 85 C and 125 C 85 C Life Tests 125 C Life Tests Sputtered Dielectric Films Silicon Nitride Other Reactively Sputtered Dielectrics Cross-Sectioning of Thin Films.

Subject Categories:

  • Electrical and Electronic Equipment

Distribution Statement:

APPROVED FOR PUBLIC RELEASE