Accession Number:

AD0420332

Title:

EPITAXIAL CONTROL SYSTEM,

Descriptive Note:

Corporate Author:

MOTOROLA INC PHOENIX ARIZ

Personal Author(s):

Report Date:

1962-12-14

Pagination or Media Count:

23.0

Abstract:

A system to test the feasibility of monitoring the vapor stream to an epitaxial reactor has been designed and constructed. The sensing mechanism is a 90 degree sector Nier type mass spectrometer with a 5cm radius. The spectrometer with a 3KG permanent magnet was shown to resolve adjacent peaks to mass 50. The spectrometer operates at a background pressure of 1 x 10 to the minus 8th power and an operating pressure greater than 1 x 10 to the minus 6th power Torr. The pumping is electronic. The spectrometer has been calibrated for the 3 KG Magnet. The sampling system was put together and its parameters were discussed. It may be that when doping gases such as phosphine or stibine are monitored, the cracking pattern of these molecules will have to serve to separate their peaks from the machine background. Author

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE