Accession Number:

AD0294120

Title:

THE SPUTTERING OF COMPOUNDS

Descriptive Note:

Corporate Author:

RAYTHEON CO WALTHAM MASS

Personal Author(s):

• WOLSKY,S.
• SHOOTER,D.
• ZDANUK,E.J.

Report Date:

1962-09-20

Pagination or Media Count:

1.0

Abstract:

Sputtering yield data, atom ejection patterns, and sputtered film composition all support a molecular sputtering mechanism of GaSb. The surface structure models used to explain the atom ejection patterns are discussed. Selective sputtering of Ga was noted. Considerable information was obtained concerning the sputtering of diamond structure materials. Author

Descriptors:

• *ANTIMONY ALLOYS
• *CRYSTALS
• *GALLIUM ALLOYS
• *INTERMETALLIC COMPOUNDS
• CRYSTAL STRUCTURE
• FILMS
• IONS
• RELIABILITY
• SURFACES
• VACUUM APPARATUS

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE