Accession Number:

AD0281887

Title:

CHEMICAL VAPOR DEPOSITION

Descriptive Note:

Corporate Author:

BATTELLE MEMORIAL INST COLUMBUS OH DEFENSE METALS INFORMATION CENTER

Personal Author(s):

Report Date:

1962-06-04

Pagination or Media Count:

87.0

Abstract:

Papers on chemical vapor deposition including possibilities and problems of chemical vapor deposition, growth of crystalline films, whisker growth, vapor deposition of diffusion coating, vapor-phase transfer processes. Contents The Promise and Problems of Chemical Vapor Deposition High-Purity Metal Production Coating of Particles Molecular Electronics Refractory Metal Coatings Corrosion-Resistant Coating Pyrolytic C Refractory Carbon Growth of Crystalline Films and Layers by Chemical Vapor Deposition Bulk Deposits Thin-Films and Epitaxial Growth Whisker Growth Metal-Organic Decomposition Mechanisms For Metal Alkyl Decomposition Stable Organic Molecule Decomposition of Tetraphenylsilane Decomposition of Tetracyclohexylsilane Chemical Vapor Deposition of Diffusion Coatings Vapor- Phase-Transfer Processes During Vapor Deposition Surface Deposition - Gas Kinetics Controlling Surface Deposition - Gas Diffusion Controlling Problems Requiring Additional Research.

Subject Categories:

  • Industrial Chemistry and Chemical Processing

Distribution Statement:

APPROVED FOR PUBLIC RELEASE