Accession Number:

AD0276228

Title:

RESEARCH ON VACUUM EVAPORATED AND CATHODE SPUTTERED THIN FILMS

Descriptive Note:

Corporate Author:

GEORGIA INST OF TECH ATLANTA ENGINEERING EXPERIMENT STATION

Personal Author(s):

Report Date:

1962-02-01

Pagination or Media Count:

1.0

Abstract:

An investigation was made to examine the structure and properties of thin evaporated or sputtered films in order to seek methods of improving film properties that may be found of use in future electronic or related scientific applications. Of particular interest was a study of the growth of highly ordered films on monocrystalline substrates. Approximately 175 film specimens were prepared by evaporation onto monocrystalline NaCl substrates maintained at selected temperatures in the range 25 to 500 C. These consisted primarily of 92 Cu films, 42 Ag films, 34 Au films and 7 Ge films. Some films were deposited on MgO, glass and SiO substrates as well. Of these specimens 100 were examined by electron diffraction, 35 by electron microscopy and 41 by x-ray diffraction. Cu films exhibited and increase in ordering with temperature increase in the range 25 to 300 C. They also exhibited an increase in ordering at a given temperature with increase in evaporation rate or film thickness the evaporation rates studied were 1 to 1000 angstromssec and the film thickness ranges were 200 to 2000 angstroms for the electron diffraction studies and 2000 to 4000 angstroms for x-ray diffraction. Author

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Distribution Statement:

APPROVED FOR PUBLIC RELEASE