Accession Number:

AD0270814

Title:

THE INFLUENCE OF COMPLEX ION FORMATION DURING DIFFUSION ON THE DISTRIBUTION OF IMPURITIES IN SILICON

Descriptive Note:

Corporate Author:

ELECTRON DEVICE LAB OHIO STATE UNIV RESEARCH FOUNDATION COLUMBUS

Personal Author(s):

• THURSTON,M.O.
• TSAI,JOSEPH

Report Date:

1961-11-01

Pagination or Media Count:

1.0

Abstract:

Descriptors:

• *IONS
• *DILATOMETERS
• *DIOXIDES
• *IMPURITIES
• *SILICON
• *SILICON COMPOUNDS
• ANTIMONY
• BORON
• DIFFUSION
• IONS
• LITHIUM
• OXIDES
• TEMPERATURE
• THIN FILM STORAGE DEVICES

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE