Accession Number:

AD0260088

Title:

PLASMA SHEATH FORMATION BY RF FIELDS

Descriptive Note:

Corporate Author:

STANFORD UNIV CALIF MICROWAVE LAB

Personal Author(s):

Report Date:

1961-04-01

Pagination or Media Count:

92.0

Abstract:

IT HAS BEEN OBSERVED EXPERIMENTALLY THAT THE APPLICATION OF A RADIOFREQUENCY VOLTAGE 20 kcs 30 M CS to any one of several electrode configurations around the outside of a plasma discharge tube results in a constriction of the light-emitting portion of the plasma away from the inner walls of the glass tube. This phenomenon was initially thought to be the result of the rf confinement mechanism proposed by Weibel and by Boots, et. al. However, our investigation has established that the phenomenon is not rf confinement but rather the result of an interaction between the externally applied rf voltage and the plasma which leads to the formation of a dc positive ion sheath. Four experimental measurements together with a description of the equipment utilized in obtaining them are presented which define the general characteristics of the interaction. Author

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE