Accession Number:

AD0259821

Title:

ION BEAM APPROACH TO MICROCIRCUITRY

Descriptive Note:

Corporate Author:

VARO INC GARLAND TEX

Personal Author(s):

Report Date:

1961-06-30

Pagination or Media Count:

1.0

Abstract:

Research concerns the development of a technique for fabricating microminiaturized electronic circuits by deposition from a controlled ion beam. Such a technique would eliminate many of the problems of present methods using vapor deposition and masks to control the geometry. The present state of the art permits the essentially 2dimensional deposition of resistive, conductive, dielectric and magnetic materials on suitable substrates. Metallic or photoresist masks are used to control the geometry of the deposited material. The proposed apparatus for ion beam deposition is shown schematically. An experimental ion source was built as a first step toward the development of a deposited circuitry system using a directed beam of ions. Author

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE