Accession Number:

AD0258574

Title:

REFRACTORY COATINGS FOR TUNGSTEN

Descriptive Note:

Corporate Author:

NEW YORK UNIV N Y SCHOOL OF ENGINEERING AND SCIENCE

Personal Author(s):

• GOETZEL,C.G.
• LANDLER,P.

Report Date:

1961-03-01

Pagination or Media Count:

1.0

Abstract:

A study of the feasibility of protecting W wires against oxidation at 3300 F was undertaken. An WSi2 coat was the most promising coating for this temperature. Several siliconizing methods were given a cursory treatment, and the simplest, cementation, was selected for closer investigation. This operation was performed under flowing H atmosphere and such variables as temperature, time, and composition of the cementation pack. A single brittle WSi2 layer is formed by this method. Pack-siliconized wires can withstand oxidation at 3300 F in still air for 10 or more hours. A drawback of the disilicide coat is its low temperature oxidation which occurs in parts exposed at 1200 and 2280 F for prolonged periods. Attempts to deposit ZrO2 on top of siliconized wires by means of plasma arc spray method remained largely unsuccessful. Author

Descriptors:

• *REFRACTORY COATINGS
• *TUNGSTEN
• ANTIOXIDANTS
• BRITTLENESS
• COATINGS
• DIFFUSION
• FLAME SPRAYING
• HIGH TEMPERATURE
• OXIDATION
• OXIDES
• PROCESSING
• SILICIDES
• SILICON COATINGS
• TUNGSTEN COMPOUNDS
• VAPOR PLATING
• WIRE
• ZIRCONIUM COMPOUNDS

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE