Accession Number:

AD0248834

Title:

AN APPROACH TO MICROMINIATURE PRINTED SYSTEMS

Descriptive Note:

Corporate Author:

MASSACHUSETTS INST OF TECH CAMBRIDGE

Personal Author(s):

Report Date:

1959-09-30

Pagination or Media Count:

5.0

Abstract:

A POSSIBLE PROCESS FOR PRODUCING ETCHED WIRING ON A 0.1-MICRON SCALE IS PROPOSED. ON THE WIRES OF A 200-MESH ELECTRON MICROSCOPE SPECIMEN SCREEN WAS DEPOSITED A PARLODION FILM, AND ON THE PARLODION FILM WAS DEPOSITED A SI0 FILM. A MO FILM OF ABOUT 800 A WAS DEPOSITED ONTO THE SI0 FILM IN A VACUUM SYSTEM. THE VACUUM SYSTEM WAS OPENED AND A 400-MESH CU SPECIMEN SCREEN WAS PLACED UP AGAINST THE MO FILM. THE VACUUM SYSTEM WAS AGAIN PUMPED DOWN, AND AFTER ADMITTING A SMALL AMOUNT OF TETRAETHOXYSILANE, A 1200-VOLT ELECTRON FLOOD BEAM 1 MILLIAMPSQ CM IN CURRENT DENSITY WAS TURNED ON FOR 1 MIN. THE VACUUM SYSTEM WAS OPENED, THE 400-MESH SCREEN REMOVED, AND THE VACUUM SYSTEM CLOSED AGAIN AND PUMPED DOWN. THE SUBSTRATE WAS HEATED TO 300 DEGREES C AND C1 WAS ADMITTED TO THE VACUUM SYSTEM. AFTER 1 MIN., THE SCREEN WAS PLACED IN THE ELECTRON MICROSCOPE, AND THE MO FILM WAS SEEN TO BE CUT UP INTO SQUARES ABOUT 0.001 INCH ON A SIDE. THE RESOLUTION IS ESTIMATED TO BE FINER THAN ONE MICRON

Subject Categories:

Distribution Statement:

APPROVED FOR PUBLIC RELEASE