OFFICE OF THE SECRETARY OF THE ARMY WASHINGTON D C
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The patent describes processes for anodizing or sputtering metal anodes, or for sputtering and anodizing valve metal anodes such as tantalum substantially simultaneously, by electrically connecting the anode in a vacuum vessel and controllably impacting the anode with negative ions. Anodization will occur when lower voltages are employed to propel the negative ions toward the anode whereas higher voltages will result in sputtering of the anode. Intermediate voltages will produce the phenomenon of sputtering and anodization of suitable surfaces.
- Coatings, Colorants and Finishes
- Fabrication Metallurgy