Accession Number : ADA591313


Title :   High Rate Deposition of Thick CrN and Cr2N Coatings Using Modulated Pulse Power (MPP) Magnetron Sputtering


Descriptive Note : Technical rept.


Corporate Author : ARMY ARMAMENT RESEARCH DEVELOPMENT AND ENGINEERING CENTER WATERVLIET NY BENET LABS


Personal Author(s) : Lin, Jianliang ; Sproul, William D ; Moore, John J ; Lee, Sabrina ; Myers, Sterling


Full Text : https://apps.dtic.mil/dtic/tr/fulltext/u2/a591313.pdf


Report Date : Dec 2010


Pagination or Media Count : 43


Abstract : As a variation of high power pulsed magnetron sputtering technique, modulated pulse power (MPP) magnetron sputtering can achieve a high deposition rate while at the same time achieving a high degree of ionization of the sputtered material with low ion energies. These advantages of the MPP technique can be utilized to obtain dense coatings with a small incorporation of the residual stress and defect density for the thick coating growth. In this study, the MPP technique has been utilized to reactively deposit thick Cr2N and CrN coatings (up to 55 m) on AISI 440C steel and cemented carbide substrates in a closed field unbalanced magnetron sputtering system.


Descriptors :   *CHROMIUM , *COATINGS , *MECHANICAL PROPERTIES , *NITRIDES , *SPUTTERING , DEPOSITION , MAGNETRONS , MICROSTRUCTURE , PULSE MODULATION , TRIBOLOGY , WEAR


Subject Categories : Inorganic Chemistry
      Coatings, Colorants and Finishes
      Properties of Metals and Alloys
      Fabrication Metallurgy
      Physics


Distribution Statement : APPROVED FOR PUBLIC RELEASE