Accession Number : ADA573951


Title :   A Method for Atomic Layer Deposition of Complex Oxide Thin Films


Descriptive Note : Master's thesis


Corporate Author : DREXEL UNIV PHILADELPHIA PA DEPT OF MATERIALS SCIENCE AND ENGINEERING


Personal Author(s) : Beatty, Brian R


Full Text : https://apps.dtic.mil/dtic/tr/fulltext/u2/a573951.pdf


Report Date : Dec 2012


Pagination or Media Count : 106


Abstract : Advanced technologies derive many of their capabilities from the advanced materials that they are made from. Complex oxides are a class of materials which are driving technological advancement in a host of different directions. These highly functional materials have a great variety of useful properties, which can be chosen and even engineered. Advanced materials require advanced deposition methods. Atomic layer deposition (ALD), a variant of chemical vapor deposition (CVD), is gaining more use in industry for its ability to provide ultra-high film thickness resolution (down to 0.1 nm), capability to conformally coat three-dimensional structures, and its high uniformity across large surface areas. Additionally, ALD processes provide a possibility to improve economic and environmental viability of the process as compared to CVD by using and wasting less toxic reactants and expelling fewer nano-particulate byproducts. ALD processes are highly mature for many binary oxides commonly used in the semiconductor industries, however processes for depositing heavy metal oxides and complex oxides--oxides containing two or more separate metallic cations-- are sorely lacking in literature.


Descriptors :   *ATOMIC LAYER EPITAXY , *COMPLEX COMPOUNDS , *OXIDES , *THIN FILMS , ANNEALING , ATOMIC STRUCTURE , BAND GAPS , CHEMICAL VAPOR DEPOSITION , DATA ACQUISITION , DIFFERENTIAL SCANNING CALORIMETRY , FERROELECTRICITY , LEAD TITANATES , ORGANOMETALLIC COMPOUNDS , OXIDIZERS , PHOTONS , SOL GEL PROCESSES , TEMPERATURE , THERMAL ANALYSIS , THERMOGRAVIMETRIC ANALYSIS , X RAY DIFFRACTION , X RAY SPECTROSCOPY


Subject Categories : Inorganic Chemistry
      Electrical and Electronic Equipment
      Crystallography
      Solid State Physics


Distribution Statement : APPROVED FOR PUBLIC RELEASE