Accession Number : ADA273394


Title :   Ferroelectric Thin Films III, Symposium Held in San Francisco, California on April 13 - 16, 1993. Materials Research Society Symposium Proceedings, Volume 310


Corporate Author : MATERIALS RESEARCH SOCIETY PITTSBURGH PA


Personal Author(s) : Myers, Edward R ; Tuttle, Bruce A ; Desu, Seshu B ; Larsen, Poul K


Full Text : https://apps.dtic.mil/dtic/tr/fulltext/u2/a273394.pdf


Report Date : 16 Apr 1993


Pagination or Media Count : 491


Abstract : This symposium showcased the advancement in processing technology and basic scientific understanding of ferroelectric thin films. The conference highlighted the use of novel materials science analysis techniques to characterize ferroelectric thin film materials and devices and to relate the nanoscale features and responses detected by these techniques to ferroelectric, electrooptic and piezoelectric properties. Examples of newer material analysis techniques included atomic force microscopy, electron spin resonance, high resolution transmission electron microscopy, combined Rutherford backscattering- nuclear reaction analysis and the use of optical interferometry to provide a three dimensional representation of field induced displacement.


Descriptors :   *THIN FILMS , *FERROELECTRIC MATERIALS , OPTICS , SYMPOSIA , CHEMICAL VAPOR DEPOSITION , HIGH RESOLUTION , ELECTRICAL PROPERTIES , THREE DIMENSIONAL , INTERFEROMETRY , PIEZOELECTRIC MATERIALS , NUCLEAR REACTIONS , PYROLYSIS , BARIUM , SPUTTERING , NIOBIUM , ELECTRODES , CERAMIC MATERIALS , ELECTRON MICROSCOPY , ELECTRON SPIN RESONANCE , BACKSCATTERING , ELECTROOPTICS , DISPLACEMENT


Subject Categories : Coatings, Colorants and Finishes
      Electricity and Magnetism
      Optics
      Solid State Physics


Distribution Statement : APPROVED FOR PUBLIC RELEASE