Accession Number : ADA266754


Title :   A High Flux Radical Beam Diamond Growth


Descriptive Note : Final rept. 30 Apr 90-29 Apr 93,


Corporate Author : WISCONSIN UNIV-MADISON DEPT OF PHYSICS


Personal Author(s) : Lawler, J E ; Anderson, L W


Full Text : https://apps.dtic.mil/dtic/tr/fulltext/u2/a266754.pdf


Report Date : 10 Jun 1993


Pagination or Media Count : 5


Abstract : Research on chemical vapor deposition (CVD) of diamond films is summarized. The development of a technique for High Sensitivity Absorption Spectroscopy at deep ultraviolet wavelengths in CVD systems is reported. Diagnostic experiments on the diamond CVD environment are described.


Descriptors :   *METHYL RADICALS , *FILMS , *DIAMONDS , ENVIRONMENTS , CHEMICALS , VAPOR DEPOSITION , MOLECULAR BEAMS , CHEMICAL REACTIONS , CHEMICAL RADICALS , HIGH SENSITIVITY , ABSORPTION , SURFACES , ATOMS , FLUX(RATE) , GROWTH(GENERAL) , MOLECULES , SPECTROSCOPY


Subject Categories : Physical Chemistry
      Coatings, Colorants and Finishes
      Crystallography
      Atomic and Molecular Physics and Spectroscopy


Distribution Statement : APPROVED FOR PUBLIC RELEASE