Accession Number : ADA265998


Title :   A Novel Photosensitive Polyimide Resist Consisting of a Soluble Polyimide and a Bis(perfluorophenyl Azide) as a Cross-Linker


Descriptive Note : Technical rept. Mar 92-Jun 93,


Corporate Author : OREGON UNIV EUGENE DEPT OF CHEMISTRY


Personal Author(s) : Cai, Sui X ; Wybourne, M N ; Keana, John F


Full Text : https://apps.dtic.mil/dtic/tr/fulltext/u2/a265998.pdf


Report Date : 10 Jun 1993


Pagination or Media Count : 15


Abstract : A photosensitive polyimide resist that consists of a soluble polyimide 5 and bisPFPA 6 as a cross-linker has been formulated. Polyimide 5 containing 11 wt% of bisPFPA has a deep-UV sensitivity of 30-35 mJ sq cm while polyimide 5 itself has a deep-UV sensitivity of 350-400 mJ sq cm. Under our present conditions, features of about 0.5 um could be resolved with this resist system.... Polymers, Deep-UV negative resist


Descriptors :   *POLYMERS , *IMIDES , CROSSLINKING(CHEMISTRY) , FLUORINE , PHOTOSENSITIVITY , AZIDES , SOLUBILITY , PHENYL RADICALS


Subject Categories : Organic Chemistry
      Polymer Chemistry
      Optics


Distribution Statement : APPROVED FOR PUBLIC RELEASE