Accession Number : ADA265288


Title :   Photogenerated Base in Polymer Imaging. Synthesis and Photopatterning of Poly(2-cyano-2-(p-vinylphenyl) Butanoic Acid)


Descriptive Note : Technical rept.,


Corporate Author : CORNELL UNIV ITHACA NY DEPT OF CHEMISTRY


Personal Author(s) : Leung, Man-Kit ; Frechet, Jean M ; Cameron, James F ; Willson, C G


Full Text : https://apps.dtic.mil/dtic/tr/fulltext/u2/a265288.pdf


Report Date : 12 May 1993


Pagination or Media Count : 13


Abstract : Since the concept of chemical amplification was first introduced by us more that twelve years ago, a number of new resists based on acid-catalyzed thermolysis have been developed and commercialized. This report describes the first chemically amplified resist operating through photogenerated base. The concept is demonstrated with poly(2-cyano-2-(p-vinylphenyl)butanoic acid) which decarboxylates readily under basic conditions. A resist system consisting of this polymer and an amine photogenerator bis(2,6-dinitrobenzyloxy)carbonylhexan- 1,6-diamine has been formulated and tested in microlithography. The sensitivity of this resist is extremely high (1.4 mj/sq cm) with a very high contrast of 13. 7. This very high sensitivity confirms that chemical amplification is achieved as the photogenerated base is not consumed in the overall decarboxylation process. The mechanistic insights gained from the study of the decarboxylation process may be used in the designed of other resists involving more readily accessible polymers.


Descriptors :   *POLYMERS , *AMPLIFICATION , SYNTHESIS , CHEMISTRY , CHEMICAL REACTIONS , ACIDS , HIGH SENSITIVITY , BASES(CHEMISTRY) , CATALYSIS , IMAGES , AMINES , CHEMICALS


Subject Categories : Organic Chemistry
      Physical Chemistry
      Radiation and Nuclear Chemistry
      Polymer Chemistry


Distribution Statement : APPROVED FOR PUBLIC RELEASE