Accession Number : ADA265152


Title :   Thermal-Optical Switching of a Silicon Based Interference Filter


Descriptive Note : Technical rept.


Corporate Author : NORTH CAROLINA UNIV AT CHAPEL HILL DEPT OF CHEMISTRY


Personal Author(s) : Augustine, B H ; Feng, S T ; Irene, E A


Full Text : https://apps.dtic.mil/dtic/tr/fulltext/u2/a265152.pdf


Report Date : 04 May 1993


Pagination or Media Count : 13


Abstract : We report thermal-optical switching using a silicon based interference filter fabricated by plasma enhanced chemical vapor deposition. A five film structure using high index films of amorphous Si and low index films of SiO2 comprised the device which yielded detector limited 40 ns rise time switching. Operation is in the near infrared spectral region with probe wavelengths of 810 nm and 1.152 micrometers. A 56% contrast ratio is reported when pumped by a 10.6 micrometers C02 pulsed laser. Lover contrast switching-was also demonstrated with a Nd:YAG pumped dye laser tunable from 600-700 nm. In addition, we have demonstrated that atomic layer thickness precision is not necessary, and suggest several improvements which can further enhance device performance. Thermal-optical switching, Silicon.


Descriptors :   *SILICON , *FILTERS , *OPTICAL SWITCHING , PROBES , RATIOS , THICKNESS , CONTRAST , DETECTORS , CHEMICALS , LAYERS , VAPORS , STRUCTURES , MICROMETERS , ADDITION , SWITCHING , DYE LASERS , INDEXES , OPERATION , INTERFERENCE , PRECISION , FILMS , VAPOR DEPOSITION , PULSED LASERS , LASERS , REGIONS , TIME , DEPOSITION


Subject Categories : Electrooptical and Optoelectronic Devices


Distribution Statement : APPROVED FOR PUBLIC RELEASE