Accession Number : ADA265071


Title :   Ferroelectric Thin Films. Materials Research Society Symposium Proceedings Held in San Francisco, California on April 16-20, 1990. Volume 200


Corporate Author : MATERIALS RESEARCH SOCIETY PITTSBURGH PA


Personal Author(s) : Myers, Edward R ; Kingon, Angus I


Report Date : Jan 1990


Pagination or Media Count : 348


Abstract : The area of ferroelectric thin films has expanded rapidly recently with the advent of high quality multi-oxide deposition technology. Advances in thin film quality has resulted in the realization of new technologies not achievable through classical bulk ceramic processing techniques. An example of this progress is the co-processing of ferroelectric thin films with standard semiconductor silicon and GaAs integrated circuits for radiation hard, non- volatile memory products. While the development of this class of products is still embryonic, the forecasted market potential is rapidly out distancing the combined developmental effort. Historically the greatest use of bulk ferroelectric material has been in sensor technology, utilizing the pyroelectric and piezoelectric properties of the material. By comparison, a relatively small development effort has been reported for ferroelectric thin film sensor technology, a field sure to provide exciting advances in the future


Descriptors :   *THIN FILMS , *FERROELECTRIC MATERIALS , MICROSTRUCTURE , SYMPOSIA , VAPOR DEPOSITION , ELECTRICAL PROPERTIES , TITANATES , ZIRCONATES , LEAD(METAL) , PYROLYSIS , LITHIUM NIOBATES , SPUTTERING , CHEMICAL REACTIONS , ION BEAMS , DETECTORS , ELECTROOPTICS


Subject Categories : Physical Chemistry
      Electrooptical and Optoelectronic Devices
      Electricity and Magnetism
      Optics


Distribution Statement : APPROVED FOR PUBLIC RELEASE