Accession Number : ADA262115
Title : Kinetics and Thermochemistry of Tetramethyl and Tetraethyl Orthosilicates in the Gas Phase
Descriptive Note : Technical rept.
Corporate Author : EMORY UNIV ATLANTA GA DEPT OF CHEMISTRY
Personal Author(s) : Chu, Jason C ; Soller, R ; Lin, M C ; Melius, C F
Report Date : Jan 1991
Pagination or Media Count : 7
Abstract : Recently there has been considerable interest in the chemistry of tetraalkyl orthosilicates, particularly with respect to the deposition of SiO2 insulating films using tetraethyl orthosilicate and other larger members of the homolog. Most of these studies were carried out on solid surfaces and often involved the interaction of various silicate molecules with hydroxyl groups on the surface. To date, very little information is available on the thermochemistry and the stabilities of the whole class of Si(OR)4 molecules, where R equals alkyl. For example, what is the strength of the RO-Si(OR)3 or the R-OSi(OR)3 bond? To our knowledge, no such information is available in the literature today. In order to understand the basic thermochemistry of the Si(OR) 4 molecules, we have recently investigated the kinetics of thermal decomposition of tetramethyl orthosilicate (TMOS) and tetraethyl orthosilicate (TEOS) in the gas phase by Fourier transform infrared spectrometry.
Descriptors : *THERMOCHEMISTRY , *KINETICS , *SILICATES , METHYL RADICALS , ENERGY , FILMS , PHASE , ALKYL RADICALS , ETHYL RADICALS , PERTURBATIONS , GASES , SURFACES , CHEMICAL BONDS , DEPOSITION
Subject Categories : Organic Chemistry
Distribution Statement : APPROVED FOR PUBLIC RELEASE