Accession Number : ADA261464


Title :   Improvements in Aluminum Adhesion and Breakdown Voltages of Polyvinylidene Fluoride Films Following Exposure to Gas Plasmas


Descriptive Note : Technical rept. May 1990-May 1991,


Corporate Author : ARMY LAB COMMAND FORT MONMOUTH NJ ELECTRONICS TECHNOLOGY AND DEVICES LAB


Personal Author(s) : Mammone, Robert J ; Wade, Jr , William L ; Binder, Michael


Full Text : https://apps.dtic.mil/dtic/tr/fulltext/u2/a261464.pdf


Report Date : May 1991


Pagination or Media Count : 10


Abstract : Changes in water wettability, improvement in adhesion of vapor- deposited aluminum, and increases in dielectric breakdown voltage in thin, 12- micron Polyvinylidene fluoride (PVDF) films were observed following their brief exposure to low-temperature gas plasmas.... Polyvinylidene fluoride, Breakdown voltage, Aluminum adhesion.


Descriptors :   *PLASMAS(PHYSICS) , *ADHESION , *FILMS , *VOLTAGE , *ALUMINUM , *POLYVINYLIDENES , *FLUORIDES , *GASES , TEMPERATURE , LOW TEMPERATURE , PIEZOELECTRICITY , CAPACITORS , BREAKDOWN(ELECTRONIC THRESHOLD) , CRYSTAL STRUCTURE , VAPOR DEPOSITION , DIELECTRICS , EXPOSURE(GENERAL) , VAPORS , WATER , POLYMERS


Subject Categories : Physical Chemistry
      Polymer Chemistry
      Crystallography
      Electricity and Magnetism


Distribution Statement : APPROVED FOR PUBLIC RELEASE