Accession Number : ADA259089


Title :   Advanced UHV Thin-Film Deposition Facility for Research in Superconductivity and Superconducting Electronics


Descriptive Note : Final rept.


Corporate Author : STANFORD UNIV CA


Personal Author(s) : Beasley, M R ; Hammond, R H


Full Text : https://apps.dtic.mil/dtic/tr/fulltext/u2/a259089.pdf


Report Date : 28 Oct 1992


Pagination or Media Count : 4


Abstract : The final report for the above grant describes an 'Advanced UHV Thin- Film Deposition Facility for Research in Superconductivity and Superconducting Electronics.' A list of acquired equipment and a discussion of special circumstances regarding changes from the proposal and use of the equipment also follows. The completed facility is in full use for research as described in the proposal, and in high Tc superconducting materials research, other oxide materials, and C60 Fullerene alloys. A new vapor synthesis process monitor and control techniques (Atomic Absorption Rate Control) has been developed.


Descriptors :   *THIN FILMS , *SUPERCONDUCTIVITY , ELECTRONICS , MATERIALS , RESEARCH FACILITIES , ALLOYS , DEPOSITION , ABSORPTION , ULTRAHIGH VACUUM , ATOMIC SPECTRA , CHAMBERS , LABORATORY EQUIPMENT , OXIDES , ELECTRICAL CONDUCTIVITY , CARBON , VAPOR DEPOSITION , HIGH TEMPERATURE


Subject Categories : Electrical and Electronic Equipment
      Logistics, Military Facilities and Supplies
      Electricity and Magnetism
      Solid State Physics


Distribution Statement : APPROVED FOR PUBLIC RELEASE