Accession Number : ADA259089
Title : Advanced UHV Thin-Film Deposition Facility for Research in Superconductivity and Superconducting Electronics
Descriptive Note : Final rept.
Corporate Author : STANFORD UNIV CA
Personal Author(s) : Beasley, M R ; Hammond, R H
Report Date : 28 Oct 1992
Pagination or Media Count : 4
Abstract : The final report for the above grant describes an 'Advanced UHV Thin- Film Deposition Facility for Research in Superconductivity and Superconducting Electronics.' A list of acquired equipment and a discussion of special circumstances regarding changes from the proposal and use of the equipment also follows. The completed facility is in full use for research as described in the proposal, and in high Tc superconducting materials research, other oxide materials, and C60 Fullerene alloys. A new vapor synthesis process monitor and control techniques (Atomic Absorption Rate Control) has been developed.
Descriptors : *THIN FILMS , *SUPERCONDUCTIVITY , ELECTRONICS , MATERIALS , RESEARCH FACILITIES , ALLOYS , DEPOSITION , ABSORPTION , ULTRAHIGH VACUUM , ATOMIC SPECTRA , CHAMBERS , LABORATORY EQUIPMENT , OXIDES , ELECTRICAL CONDUCTIVITY , CARBON , VAPOR DEPOSITION , HIGH TEMPERATURE
Subject Categories : Electrical and Electronic Equipment
Logistics, Military Facilities and Supplies
Electricity and Magnetism
Solid State Physics
Distribution Statement : APPROVED FOR PUBLIC RELEASE