Accession Number : ADA256774


Title :   Unique Hydride Chemistry on Silicon - PH3 Interaction with Si(100)-(2x1)


Corporate Author : CALIFORNIA UNIV DAVIS DEPT OF WATER SCIENCE AND ENGINEERING


Personal Author(s) : Colaianni, M L ; Chen, P J ; Yates, Jr, J T


Full Text : https://apps.dtic.mil/dtic/tr/fulltext/u2/a256774.pdf


Report Date : Sep 1992


Pagination or Media Count : 26


Abstract : The dissociative adsorption of phosphine (PH3) on Si(1 00)-(2x1) and its high temperature thermal behavior have been studied by high-resolution electron energy loss spectroscopy (HREELS), Auger electron spectroscopy (AES) and by temperature programmed desorption (TPD). Phosphine adsorbs dissociatively onto Si(100)-(2x1) at 100 K as PH2 and H species, as revealed by vibrational bands at 1050 cm/1 (Delta sub sc(PH2)) and 2100 cm-/1(v(Si-H)). The PH2(a) undergoes thermal decomposition to adsorbed P and H near 650 K, as determined by HREELS. TPD measurements reveal two PH3 desorption processes at 485 and 635 K. The 635 K-desorption is shown to result from PH2 + H recombination, while the mechanism for the 485 K-desorption cannot be definitively identified. Additionally, two H2 desorption states were observed at 685 and 770 K. Comparison of these features with H2 desorption from clean and phosphorus- modified silicon Indicates that the 685- and 770 K-H2 desorption kinetics are controlled by thermal dissociation of adsorbed PHx species which supply hydrogen to the surface.


Descriptors :   *HYDRIDES , *INTERACTIONS , *CHEMISTRY , *DESORPTION , *PHOSPHINE , *SILICON , MEASUREMENT , ADSORPTION , COMPARISON , RESOLUTION , HYDROGEN , ELECTRON ENERGY , AUGERS , ELECTRON SPECTROSCOPY , AUGER ELECTRON SPECTROSCOPY , DECOMPOSITION , PHOSPHORUS , DISSOCIATION , SUPPLIES , KINETICS , DOPING , AUGER ELECTRONS , ELECTRONS , SURFACES , HIGH RESOLUTION , ENERGY , HIGH TEMPERATURE , SPECTROSCOPY , TEMPERATURE


Subject Categories : Inorganic Chemistry
      Physical Chemistry


Distribution Statement : APPROVED FOR PUBLIC RELEASE