Accession Number : ADA255497


Title :   A Simple Controller for Repetitive Cycles in Atomic Layer Epitaxy


Descriptive Note : Technical rept.


Corporate Author : TEXAS UNIV AT AUSTIN DEPT OF ELECTRICAL AND COMPUTER ENGINEERING


Personal Author(s) : Kinosky, D ; Mahajan, A ; Qian, R ; Thomas, S ; Banerjee, S ; Tasch, A


Full Text : https://apps.dtic.mil/dtic/tr/fulltext/u2/a255497.pdf


Report Date : 03 Jun 1992


Pagination or Media Count : 3


Abstract : A simple controller system has been designed and added to an existing deposition system in order to implement deposition of silicon by Atomic Layer Epitaxy (ALE). A Remote Plasma-enhanced Chemical Vapor Deposition (RPCVD) system has been modified for automatic control of repetitive cycles of disilane dosing and hydrogen desorption via low energy ion bombardment. The simple configuration of the input/output modules and ease of programming allowed efficient debugging of the installation and a large degree of flexibility in in situ cleaning and in both ALE and CVD experiments.


Descriptors :   *CONTROL SYSTEMS , *CHEMICAL VAPOR DEPOSITION , *ATOMIC LAYER EPITAXY , INPUT , LAYERS , HYDROGEN , LOW ENERGY , CONFIGURATIONS , DESORPTION , ION BOMBARDMENT , AUTOMATIC , CLEANING , SILICON , DEPOSITION , CYCLES , COMPUTER PROGRAMMING , OUTPUT


Subject Categories : Coatings, Colorants and Finishes
      Mfg & Industrial Eng & Control of Product Sys


Distribution Statement : APPROVED FOR PUBLIC RELEASE