Accession Number : ADA254119


Title :   Single Liquid Source Plasma Enhanced Metalorganic Chemical Vapor Deposition of YBa2Cu3O7-x Thin Films


Descriptive Note : Technical rept.,


Corporate Author : ADVANCED TECHNOLOGY MATERIALS INC DANBURY CT


Personal Author(s) : Zhang, Jiming ; Gardiner, Robin ; Kirlin, Peter S ; Boerstler, Robert W ; Steinbeck, John


Full Text : https://apps.dtic.mil/dtic/tr/fulltext/u2/a254119.pdf


Report Date : 29 Jul 1992


Pagination or Media Count : 13


Abstract : High quality YBa2Cu3O7-x films were grown in-situ on LaA103 (100) by a novel single liquid source plasma-enhanced metalorganic chemical vapor deposition process. The metalorganic complexes M(thd)n, (thd = 2,2,6,6- tetramethyl-3,5-heptanedionate; M = Y, Ba, Cu) were dissolved in an organic solution and injected into a vaporizer immediately upstream of the reactor inlet. The single liquid source technique dramatically simplifies current CVD processing and can significantly improve the process reproducibility. X-ray diffraction measurements indicated that single phase, highly c-axis oriented YBa2Cu3O7-x was formed in-situ at a substrate temperature 680 deg C. The as-deposited films exhibited a mirror-like surface, had transition temperature Tco = 89 K, Delta Tc 1K, and Jc(77K) = 106 A/cm2.


Descriptors :   *SUPERCONDUCTORS , *VAPOR DEPOSITION , MIRRORS , MEASUREMENT , TEMPERATURE , CHEMICALS , THIN FILMS , FILMS , SEMICONDUCTOR DEVICES , COPPER , DIFFRACTION , QUALITY , TRANSITION TEMPERATURE , DEPOSITION , OXYGEN , SURFACES , PHASE , X RAYS , DELTAS , YTTRIUM , SILICON CARBIDES , LANTHANUM , REPRODUCIBILITY , INLETS , BARIUM , TRANSITIONS , SUBSTRATES , FABRICATION , X RAY DIFFRACTION , LIQUIDS , VAPORS , PROCESSING , PLASMAS(PHYSICS)


Subject Categories : Physical Chemistry
      Coatings, Colorants and Finishes
      Plasma Physics and Magnetohydrodynamics


Distribution Statement : APPROVED FOR PUBLIC RELEASE