Accession Number : ADA253579


Title :   Interfacial and Thin Film Chemistry in Electron Device Fabrication


Descriptive Note : Final rept. 15 Sep 1986-31 Dec 1991


Corporate Author : COLUMBIA UNIV NEW YORK MICROELECTRONICS SCIENCE LAB


Personal Author(s) : Auston, D ; Flynn, G ; Herman, I ; Osgood, R ; Turro, N


Full Text : https://apps.dtic.mil/dtic/tr/fulltext/u2/a253579.pdf


Report Date : Jan 1992


Pagination or Media Count : 69


Abstract : Progress on the Columbia URI program on INTERFACIAL AND THIN FILM CHEMISTRY IN ELECTRON DEVICE FABRICATION is reported for the 1986-1991 period. Three broad areas of research included MBE Growth and Devices, Laser Surface Interactions, and Fundamentals of Processing Gas/Surface Interactions. Research in the area of MBE Growth and Devices included Heterostructures Grown by Molecular Beam Epitaxy by Professor Wen Wang and Interface Chemical Modification of Metal on Superconductor-Semiconductor Systems by Professor Ed Yang. Research in the area of Laser Surface Interactions included Laser-Surface Interactions and In Situ Diagnostics of Surface Chemistry During Electronic Processing by Professor Richard Osgood, Jr.; In Situ Optical Diagnostics of Semiconductors Prepared by Laser Chemical Processing and Other Novel Methods by Professor Irving Herman; and Ultrafast Optoelectronic Measurements of Surfaces and Interfaces by Professor David Auston. Research in Fundamentals of Processing Gas/Surface Interactions included Quantum State-Resolved Studies of Gas/Surface Chemical Reactions by Professor George Flynn and Photochemical and Photophysical Probes of Interfaces by Professor Nicholas Turro. Research results of Columbia's Principal Investigators supported by ONR/URI were published in nearly 200 scholarly articles which are listed in this report.


Descriptors :   *INTERFACES , *SUPERCONDUCTORS , *THIN FILMS , *LASERS , *MOLECULAR BEAMS , *SEMICONDUCTORS , *FABRICATION , *CHEMISTRY , *GAS SURFACE INTERACTIONS , DIODES , ELECTRONICS , METALS , MEASUREMENT , PROBES , MODIFICATION , ELECTRON SCATTERING , COPPER , ELECTRONS , SURFACES , ETCHING , ALLOYS , ATOMS , ELECTRONIC EQUIPMENT , FILMS , SUPERLATTICES , HYDROSTATIC PRESSURE , CHARGE COUPLED DEVICES , ACIDS , CHLORINE , COLLISIONS , MODULATORS , CHANNELS , SILICON CARBIDES , EXCIMERS , GERMANIUM , TUNNELING , SURFACE CHEMISTRY , TRANSITIONS , CHEMICAL REACTIONS , GALLIUM ARSENIDES , PROCESSING , SCATTERING , VIBRATION , INTERACTIONS , CHEMICALS , DYNAMICS


Subject Categories : Physical Chemistry
      Electrical and Electronic Equipment
      Metallurgy and Metallography


Distribution Statement : APPROVED FOR PUBLIC RELEASE