Accession Number : AD1041620

Title :   RF-Trapped Chip Scale Helium Ion Pump (RFT-CHIP)

Descriptive Note : Technical Report,27 Aug 2014,06 Apr 2016

Corporate Author : The Regents of the University of Michigan Office of Research and Sponsored Projects Ann Arbor United States

Personal Author(s) : Gianchandani,Yogesh ; Kushner,Mark ; Green,Scott ; Markosyan,Aram ; Deng,Shiyang

Full Text :

Report Date : 06 Apr 2016

Pagination or Media Count : 38

Abstract : A miniaturized (1 cc) magnet-less RF electron trap for a helium ion pump is studied, addressing challenges associated with active pumping of atomic microsystems at low pressures (1 nanoTorr). Two tasks are described: experimental verification of electron trapping, and numerical parametric modeling of electron trapping and ionization. It is found experimentally that the steady state floating potentials on electrodes near the trap become more negative after applying certain RF power levels, demonstrating electron trapping. The electron density within the trap is estimated via numerical modeling as 1000x the density in the electron beam. Estimated Ionization rates are as high as 60E6/cc/s.

Descriptors :   ion pumps , electrons , radio frequency power , microelectromechanical systems , Vacuum pumps

Subject Categories : Pumps, Filters, Pipes, Tubing, Fittings & Vlvs

Distribution Statement : APPROVED FOR PUBLIC RELEASE