Accession Number : AD1034016

Title :   Wafer-Scale Aluminum Nanoplasmonic Resonators with Optimized Metal Deposition

Descriptive Note : Journal Article - Open Access

Corporate Author : MIT Lincoln Laboratory Lexington United States

Personal Author(s) : Liberman,Vladimir ; Diest,Kenneth A ; Stull,Corey ; Cook,Matthew ; Lennon,Donna M ; Rothschild,Mordechai ; Schoeche,Stefan

Full Text :

Report Date : 04 Jan 2016

Pagination or Media Count : 32

Abstract : Spectroscopic ellipsometry is demonstrated to be an effective technique for assessing thequality of plasmonic resonances within aluminum nanostructures deposited with multiple techniques.The resonance quality of nanoplasmonic aluminum arrays is shown to be strongly dependent on themethod of aluminum deposition. Three-layer metal-dielectric-metal nanopillar arrays were fabricated ina complementary metal-oxide semiconductor (CMOS) facility, with the arrays of nanopillars separatedfrom a continuous metal underlayer by a thin dielectric spacer, to provide optimum field enhancement.Nanostructures patterned in optimized aluminum, which had been deposited with a high temperaturesputtering process followed by chemical mechanical planarization, display different resonance anddepolarization behavior than nanostructures deposited by the more conventional evaporation process.Full plasmonic band diagrams are mapped over a wide range of incidence angles and wavelengths usingspectroscopic ellipsometry, and compared for aluminum nanostructures fabricated with two methods.

Descriptors :   aluminum oxides , surface plasmon resonance , complementary metaloxide semiconductors , plasmonics , fabrication , electron beam lithography

Subject Categories : Electrical and Electronic Equipment

Distribution Statement : APPROVED FOR PUBLIC RELEASE