Accession Number : AD1014729


Title :   Hybrid Physical Vapor Deposition Instrument for Advanced Functional Multilayers and Materials


Descriptive Note : Technical Report,01 Aug 2014,31 Jul 2015


Corporate Author : North Carolina State University Raleigh United States


Personal Author(s) : Jon-Paul,Maria


Full Text : https://apps.dtic.mil/dtic/tr/fulltext/u2/1014729.pdf


Report Date : 27 Apr 2016


Pagination or Media Count : 11


Abstract : PI Maria received support to construct a physical vapor deposition (PVD) system that combines electron beam (e-beam) evaporation, magnetron sputtering, pulsed laser ablation, and ion-assisted deposition. The instrumentation enables clean, uniform, and rapid deposition of a wide variety of metallic, semiconducting, and ceramic thin films with microstructures and composite geometries enhanced by energetic bombardment during growth.


Descriptors :   physical vapor deposition , sputtering , EVAPORATION , ELECTRON BEAMS


Subject Categories : Mfg & Industrial Eng & Control of Product Sys


Distribution Statement : APPROVED FOR PUBLIC RELEASE