Accession Number : AD1010024

Title :   Thermally Induced Silane Dehydrocoupling on Silicon Nanostructures (International ed.)

Descriptive Note : Journal Article

Corporate Author : University of California San Diego San Diego United States

Personal Author(s) : Kim,Dokyoung ; Joo,Jinmyoung ; Pan,Youlin ; Boarino,Alice ; Jun,Yong W ; Ahn,Kyo Han ; Arkles,Barry ; Sailor,Michael J

Full Text :

Report Date : 29 Jul 2016

Pagination or Media Count : 5

Abstract : Organic trihydridosilanes can be grafted to hydrogen-terminated porous Si nanostructures with no catalyst. The reaction proceeds efficiently at 80C, and it shows little sensitivity to air or water impurities. The modified surfaces are stable to corrosive aqueous solutions and common organic solvents. Octadecylsilane H3Si(CH2)17CH3, and functional silanes H3Si(CH2)11Br, H3Si(CH2)9CH=CH2, and H3Si(CH2)2-(CF2)5CF3 are readily grafted. When performed on a mesoporous Si wafer, the perfluoro reagent yields a superhydrophobic surface (contact angle 1518). The bromo-derivative is converted to azide, amine, or alkyne functional surfaces via standard transformations, and the utility of the method is demonstrated by loading of the antibiotic ciprofloxaxin (35 by mass). When intrinsically photoluminescent porous Si films or nanoparticles are used, photoluminescence is retained in the grafted products, indicating that the chemistry does not introduce substantial nonradiative surface traps.

Descriptors :   Surface chemistry , nanoparticles , chemical reactions , hydrophobic properties , nanostructures , nanomaterials , photoluminescence , couplings , quantum dots

Distribution Statement : APPROVED FOR PUBLIC RELEASE