Accession Number : AD0475842


Title :   HIGH TEMPERATURE RESISTANT ELASTOMER COMPOUNDS


Descriptive Note : Final rept. 1 Jan-31 Dec 1964


Corporate Author : FIRESTONE TIRE AND RUBBER CO AKRON OH


Personal Author(s) : Brock, Marlyn J ; Jividen, David L ; Smith, Floyd M ; Rigby, Jack D ; Thurman, George R


Full Text : https://apps.dtic.mil/dtic/tr/fulltext/u2/475842.pdf


Report Date : Jul 1965


Pagination or Media Count : 62


Abstract : The mechanism by which butyl rubger undergoes thermal degradation in the temperature region 300 to 400 F has been investigated. Gas chromatograph techniques have been used to identify the degradation products and to determine their rates of formation. This investigation indicates that degradation upon heating may be initiated at (1) reactive sites already present in the polymer such as catalyst residues, branching, and terminal unsaturation, (2) oxygenated groups such as hydroperoxides formed during exposure to oxygen and which are unstable at low temperature and (3) other oxygenated groups more stable than hydroperoxides and which do not decompose below 400 F. Compounding evaluations were made of resin cured butyl, reclaimed silicone rubber and ethylene propylene rubber. A high temperature, high vacuum stress relaxation apparatus was designed and constructed. A limited evaluation program has indicated the design is satisfactory and the apparatus should prove useful for evaluation of polymers in high vacuum and at temperatures up to 500 F. Minor modification would permit testing in an inert gas atmosphere.


Descriptors :   *ELASTOMERS , STRESSES , GUIDED MISSILES , LOW TEMPERATURE , DEGRADATION , PROPENES , CATALYSTS , HYPERSONIC AIRCRAFT , PYROLYSIS , VULCANIZATES , SILICONE PLASTICS , HYDROPEROXIDES , BUTYL RUBBER , CONTROLLED ATMOSPHERES , RARE GASES , SUPERSONIC AIRCRAFT , ETHYLENES , HEAT RESISTANT MATERIALS , GAS CHROMATOGRAPHY , PLASTICS , VACUUM APPARATUS , OXYGEN , PHYSICAL PROPERTIES , POLYMERS , HIGH TEMPERATURE


Subject Categories : Polymer Chemistry


Distribution Statement : APPROVED FOR PUBLIC RELEASE