Accession Number : AD0447445
Title : ALL-EVAPORATED AND MASKLESS FABRICATION TECHNIQUES FOR ACTIVE DEVICES.
Descriptive Note : Interim development rept. no. 1, 28 May-28 Aug 64.
Corporate Author : CBS LABS STAMFORD CT
Report Date : 09 Sep 1964
Pagination or Media Count : 23
Abstract : The literature search and the detailed planning of the program are essentially complete. Study of work published since the preparation of the proposal has shown that a great emphasis must be placed on achieving good vacuum conditions. Accordingly, the silicon evaporation studies will be carried out in a Varian ion-pumped titanium-gettered system capable of 10 to the -10th power Torr. The ion implantation studies will be carried out in a CVC system capable of 10 to the -8th power Torr. The design of the required fixturing is essentially complete. (Author)
Descriptors : SILICON , SUBMINIATURE ELECTRONIC EQUIPMENT , ION BOMBARDMENT , PENETRATION , RESEARCH MANAGEMENT
Distribution Statement : APPROVED FOR PUBLIC RELEASE