Accession Number : AD0437914


Title :   PRODUCTION ENGINEERING MEASURE. RELIABILITY THRU PROCESS IMPROVEMENT (2N1506).


Descriptive Note : Quarterly rept. no. 6, 30 Sep-31 Dec 63,


Corporate Author : TRW SEMICONDUCTORS INC LAWNDALE CALIF


Personal Author(s) : Austin,R ; Kamienski,G ; Kellow,P ; Massaron,I


Report Date : 31 Dec 1963


Pagination or Media Count : 31


Abstract : Efforts continued on the establishment of a PEM for the 2N1506 silicon triple diffused transistor. Evaluation of lead attachment and encapsulation techniques were completed. Linear life test results indicate a low failure rate for those improvements incorporated into the 2N1506 production process, and show a capability of providing the desired reliability level. (Author)


Descriptors :   *TRANSISTORS , MANUFACTURING , SILICON , DIFFUSION , PRODUCTION , PROCESSING , ENCAPSULATION , FIXED CONTACTS , LIFE EXPECTANCY(SERVICE LIFE) , SURFACE PROPERTIES , IMPURITIES , BORON , ALUMINUM , RELIABILITY(ELECTRONICS) , TEMPERATURE , POWER , THERMAL STRESSES


Distribution Statement : APPROVED FOR PUBLIC RELEASE