Accession Number : AD0433167


Title :   FOCUSING BY AN ANISOTROPIC PLASMA INTERFACE,


Corporate Author : POLYTECHNIC INST OF BROOKLYN N Y MICROWAVE RESEARCH INST


Personal Author(s) : Felsen,L B


Report Date : 25 Oct 1963


Pagination or Media Count : 31


Abstract : When an electromagnetic source confined in a homogeneous, anisotropic plasma half space radiates into the exterior medium, focusing effects may occur wherein the influence of the plane interface bounding the plasma is similar to that of an optical lens. The existence and location of the caustics and focus depends on the various plasma parameters, in particular on the strength and orientation of the externally applied magnetic field, and the refractive index curves for the medium may be used advantageously for the prediction of their properties. After a qualitative discussion pertaining to the general gyrotropic case, a detailed field evaluation for line source and dipole excitation is carried out for the special problem of uniaxial anisotropy, corresponding to an infinitely strong external magnetic field. In this instance, the ray system and the caustics may be described in simple terms and expressions are given for the fields inside or outside focusing region. (Author)


Descriptors :   *ELECTROMAGNETIC RADIATION , PLASMAS(PHYSICS) , OPTICS , PROPAGATION , ENERGY


Distribution Statement : APPROVED FOR PUBLIC RELEASE