Accession Number : AD0275786


Title :   EPITAXIAL GROWTH OF SILICON


Corporate Author : AIR FORCE CAMBRIDGE RESEARCH LABS L G HANSCOM FIELD MASS


Personal Author(s) : REVESZ,A


Report Date : 01 Dec 1961


Pagination or Media Count : 1


Abstract : Epitaxial growth of silicon on a silicon substrate by hydrogen reduction of SiCl4 was investigated. The chemical and physical processes involved in both the growing and the preceding heat treatment processes were studied and correlated to the experimental results. Epitaxially grown single crystal silicon layers were produced at temperatures between 1100 and 1300 C. The effects of the concentration of SiCl4 in H2, the flow rate of the gas, the temperature and the surface condition of the substrate on the overall performance of the process were investigated. (Author)


Descriptors :   *SEMICONDUCTORS , *SILICON , *THIN FILM STORAGE DEVICES , CHLORIDES , EPITAXIAL GROWTH , GROWTH(PHYSIOLOGY) , HIGH TEMPERATURE , IMPURITIES , MANUFACTURING , METAL COATINGS , REDUCTION , SILICON COMPOUNDS , TRANSPORT PROPERTIES , VAPOR PLATING , VAPORS


Distribution Statement : APPROVED FOR PUBLIC RELEASE