Accession Number : AD0163648
Title : Sputtered Vapor Laser.
Descriptive Note : Patent
Corporate Author : OFFICE OF THE SECRETARY OF THE ARMY WASHINGTON D C
Personal Author(s) : Willett,Colin S.
Report Date : 16 NOV 1971
Pagination or Media Count : 5
Abstract : The invention is a sputtered vapor laser which features two discharges within a single lasing apparatus. A secondary discharge is caused to occur between an anode and a hollow cathode whose surface is coated with a suitable lasing material. The sputtering action of the secondary discharge on the surface of the hollow cathode produces vapor of the lasing material inside the hollow cathode. The electric field set up by the cathode of the primary laser discharge acts to draw the vapor of the lasing material towards the primary cathode along the main plasma section of the laser to provide the required concentration of atoms in which to sustain laser oscillation.
Descriptors : (*GAS LASERS, *PATENTS), DISCHARGE TUBES, CATHODES(ELECTRON TUBES), SPUTTERING
Subject Categories : LASERS AND MASERS
Distribution Statement : APPROVED FOR PUBLIC RELEASE